RADICAL COPOLYMERIZATION OF PARA-(2-GLYCIDYLOXYMETHYL)CYCLOPROPYL STYRENE WITH 2,3-DIMETHYLBUTADIENE-1,3 AND PROPERTIES OF THEIR COPOLYMERS

Authors

  • K. Guliyerv Institute of Polymer Materials of Azerbaijan National Academy of Sciences
  • U. Khamedovа Institute of Polymer Materials of Azerbaijan National Academy of Sciences
  • A. Guliyev Institute of Polymer Materials of Azerbaijan National Academy of Sciences

Keywords:

copolymerization, radical polymerization, cross-linking, para-(2-glycidyloxymethyl)cyclopropyl styrene, photosensitivity

Abstract

The radical copolymerization of para-(2-glycidyloxymethyl)cyclopropyl styrene (GOMCPSt) with 2,3dimethylbutadiene-1,3 (DMB) has been investigated. It has been shown that the copolymerization proceeds with opening of double bond of vinyl group of GOMCPSt and 1,4-addition with DMB. The dependence of copolymer composition on composition of the initial monomer mixture has been revealed, the copolymerization constants have been determined and the factors of activity and also polarity of the used monomers have been calculated. It has been shown that the synthesized copolymers due to availability of double bond, three-carbon cycle and epoxide group are capable for structuring under action of UV-irradiation and show good negative photosensitive properties.

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Published

2021-11-30

Issue

Vol. 1 No. 55 (2021)

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Статьи

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