NEGATIVE PHOTORESISTS ON THE BASIS OF COPOLYMERS OF 2-CHLOROMETHYL-1-(PVINYL PHENYL)CYCLOPROPANE WITH GLYCIDYL METHACRYLATE

Авторы

  • K. Guliyev Institute of Polymer Materials of Azerbaijan National Academy of Sciences
  • A. Sadygova Azerbaijan Medical University
  • T. Gulverdashvili Azerbaijan Medical University
  • M. Aliyeva Institute of Polymer Materials of Azerbaijan National Academy of Sciences
  • D. Tagiyev Azerbaijan Medical University

Ключевые слова:

copolymerization, radical polymerization, structuring, cyclopropane, photosensitivity

Аннотация

The radical copolymerization of 2-chloromethyl-1-(p-vinyl phenyl)cyclopropane with glycidyl methacrylate is carried out. The composition and structure of the obtained copolymer are established. The constant values of relative activity of monomers are determined and Q-е parameters on Alfrey-Price are calculated. The photosensitivity of new cyclopropane and epoxy-containing photosensitive copolymers is studied. The photochemical structuring is investigated and it is established that the synthesized polymer has a photosensitivity (56 cm2/J) and can be used for creation of photosensitive material.

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Опубликован

2021-02-15

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